Vanox® AOP System for High Flow TOC Reduction

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The AOP High Flow system reduces and controls difficulted to remove TOC for optimum performance. Advanced oxidation system that dynamically responds to incoming TOC levels to maintain a constant effluent.

Discontinued product
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The AOP High Flow system reduces and controls difficulted to remove TOC for optimum performance. Advanced oxidation system that dynamically responds to incoming TOC levels to maintain a constant effluent.

Discontinued product
Vanox® AOP System for High Flow TOC Reduction

Description

Challenges: Advanced semiconductor fabrication processes require a consistent supply of UPW with extremely low TOC. Seasonal variations in incoming plant water often shows up in the UPW which can directly impact the fabrication process and affect product yields. Most notorious are TOC species such as urea that are difficult to remove by conventional UPW systems. Recent discoveries indicate the species of TOC is as important as the quantity of TOC's which requires a more advanced TOC removal technology that attacks the specific TOC species that has the greatest impact. Species, such as urea, are the hardest to remove using the conventional UV or UV Peroxide / Ozone technology.

The Evoqua Solution: Our proprietary advanced oxidation process used in the Vanox® AOP System can consistently reduce TOC to 0.5 parts per billion (ppb) and treat seasonal TOC variations in feed water.. The Vanox AOP system uses a persulfate solution metered into the feedwater proportional to the incoming TOC. The water is directed to a UV reactor fitted with lamps specifically designed for activation of the persulfate to create sulfate radicals which breaks down the TOC. Patented control algorithms govern the injection of persulfate and UV lamp power to ensure that the effluent TOC is constant, regardless of the incoming TOC level.

These systems have been validated at a variety of flows and total organic carbon demands. The Vanox AOP system offers the ability to scale the systems for future demand with a modular design coupled with the process ability to see the TOC effluent where the technology node requires it to be. The fully redundant (N+1) designed Vanox AOP system provides 24/7/365 uptime.

Features

Features

  • Patented Vanox® advanced oxidation TOC reduction system
  • Fully redundant (N+1) design
  • Industrially engineered for the demanding needs of all industries including Semiconductor

Benefits

  • TOC Reduction to maintain a constant effluent regardless of incoming TOC
  • Consistent effluent TOC irrespective of incoming
  • Scalable to meet virtually any flow rate
  • 24/7/365 uptime