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VNX55-Ultra Module for Microelectronics

See All Ionpure® Continuous Electrodeionization (CEDI) Products

High-flow module, designed to produce high-purity water for the microelectronics industry


Discontinued product
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High-flow module, designed to produce high-purity water for the microelectronics industry

Discontinued product

Description

The VNX55-Ultra high flow module is designed with proven Ionpure® continuous electrodeionization (CEDI) technology to produce high purity water. Performance has been optimized to meet evolving needs for contaminant removal in ultrapure water demands of the microelectronics industry. Module performance has been optimized to meet ppt level boron levels in a single pass of EDI.

Each VNX55-Ultra industrial module has a nominal flow rate of 55 gpm (12.5 m³/h).

Multiple 55 gpm modules provide for simplified system design with flow rates up to, and greater than 1,000 gpm.

Features and Benefits

Features

  • Guaranteed 18 MΩ-cm product resistivity, optimized for microelectronics and UPW systems
  • Silica and Boron removal of ≥ 99.8%
  • Sodium and chloride removal ≥ 99.9%
  • 95-97.5% recovery for high water savings
  • Robust leak-free sealing with through-port gasket
  • High flow module reduces system costs and simplifies skid design
  • Connection fittings are included
  • On-board junction box for DC power connections
  • 50mm butt weld natural polypropylene kits and drawings available

Benefits

  • No need for acid/caustic, neutralization systems or tank exchanges
  • Significantly lowers operating costs compared to conventional ion exchange

Specs

Flow Rate, Maximum: m³/hr
  • 15
Flow Rate, Minimum: m³/hr
  • 9.5
Flow Rate, Minimum: gpm
  • 42
Flow Rate, Maximum: gpm
  • 66
Operating Temperature, Minimum: °F
  • 68
Operating Temperature, Maximum: °F
  • 113
Operating Temperature, Minimum: °C
  • 20
Operating Temperature, Maximum: °C
  • 45

Documentation